1 target application industry classification

1.1 decoration, mold coating industry target CR target (Cr), plane CR target, spray chrome pipe;

Chromium silicon target 90\/10Wt%, 50\/50at%, 25\/75at% (arc, planar target, rotating tube target);

Ti and Al targets 50\/50at%, 70Ti\/30at%, 67AL\/33at% (arc, planar target, rotating tube target);

Titanium aluminum silicon target 1:1:1at%, 1:2:1at% (arc, planar target, rotating tube target);

Titanium, titanium tube target, zirconium target;

Gold target, rose gold target;

Graphite target target, nickel, aluminum target, stainless steel target.

1.2 solar industry target

Zinc oxide aluminum target ZAO; silicon; titanium target, titanium oxide target; chromium, nickel aluminum target; target; zinc aluminum, tungsten, molybdenum

Target etc..

1.3 construction of automotive glass large area coating

Silicon aluminum target, rotating silicon aluminum oxide target; target; tin target; silicon chromium target; target; target of titanium, stainless steel target.

1.4 flat panel display industry

ITO target; silica target; high purity silicon target 5-7N; high-purity chromium target TFT 3N5; molybdenum; molybdenum tungsten titanium niobium target;

The target 90\/10wt%; high pure aluminum target.

The 1.5 optical, optical communication, optical storage industry

Silver target; tantalum target; zinc sulfide target; high purity aluminum silicon target target.

2 commonly used target

Commonly used target shape is arc target, plane target, rotating tube target.

2.1 planar target to improve the utilization rate of approach

(1) to change the direction of movement of the magnet

(2) to change the magnetic field distribution width and height

2.2 target properties and requirements

The target directly affects the quality of thin film physics, appearance, mechanical properties, so the target quality evaluation more stringent, the main

Should meet the following requirements: impurity and low oxygen content, high purity; high density; composition and fine grain size and uniform structure.

2.3 inferior target defects

A) and b) as the target surface melting CR target ablation

C) target surface pitted for arc needle resulting from improper installation of the

D) crystal coating target density is not enough, after the ablation of difference

E) plasma sprayed titanium oxide rotary tube target bad

3 introduced several commonly used target application

3.1 decoration, tooling titanium aluminum target application

High titanium aluminum: 50\/50at% 70Ti\/30at% 80Ti\/20at%

High aluminum low Ti: 67AL\/33at% 75AI\/25wt% 80AL\/20 wt%

3.2 titanium aluminum target application

Casting method. The titanium aluminum alloy target cannot avoid shrinkage cavity and, large size titanium aluminum casting and ingot can not guarantee that made the rotating pipe

Target to achieve sealing and waterproofing effect, and with the pipe wall etching, thin thickness, shrinkage cavity and as long as there is a hole communicated, dense

Sealing will become worse, the light leakage, target tube glow discharge, or a lot of miscellaneous gas and mixed in the reaction is not off the membrane is not color

Yes. Serious person directly from sparse aperture to the water pollution of vacuum chamber, it bore and the vacuum unit.

Powder metallurgy process for making titanium aluminum target no shrinkage cavity and problems, but from the micro perspective and powder metallurgy porous material,

So in order to make titanium aluminum tube rotary target, very strict requirements on the material density, density must be more than >98%. But with the density requirements are not

Representative can use. If the oxygen content of titanium ingot is high and unreasonable microstructure of titanium ingots, large internal stress, easy to collapse, but also

Can't do rotary tube target, so in the powder making and granularity proportion has many requirements. Even if these conditions are satisfied, powder metallurgy

Gold titanium aluminum ring also tied ingot in stainless steel pipe or the titanium tube, titanium aluminum due to thermal expansion coefficient is big, the sputtering target in local swelling may reach 0.5-1MM, so now the traditional tie ingot can not solve this problem. Titanium aluminum ingot appears to separation, target surface energy is not

Conduction and burst phenomenon. The so-called tight tie ingot and plasma sprayed titanium aluminum alloy target is that all solutions without meaning, not

Can use.

Shenzhen silicon target limited by powder metallurgy method patent special tie ingots made straight cold titanium aluminum tube rotary target completely solved

The technical problems, not only can produce titanium aluminum tube rotary target, can also make use of this technology in the production of titanium silicon aluminum coil target,

Titanium silicon spiral tube target, chromium silicon spiral tube target, ITO coil target etc..

In recent years, watches, jewelry, glasses industry decorative coating furnace rose gold guest request not containing carbon and further the underlying rose

Rose do close to pale rose gold requirements. So TiCN has been unable to meet the requirements of. TiAlN is the perfect solution. Low

Gear clocks jewelry no film thickness and glossiness requirements. Most of the arc deposited TiAlN titanium aluminum target. High-end brand table required thickness

Up to 1 microphones, and glossiness can not drop. No advantages in smooth thick film in terms of droplet impact arc by. At present, the better.

Type is the use of rotary tube target deposition of TiAlN, not only the color closer to the rose gold and thickness increasing gloss is not affected.

3.3 SVC series silicon alloy target

Is the main target, the deposition of superhard in watches, mobile phone is required in this regard: such as black fingerprint superhard, not

Rust steel casing and hard, imitation gold superhard etc.. The silicon series of target is the thin films of various compounds were deposited in the coating, such as chromium

Silicon target in the making of IP black film into the reaction gas of C2H2 and C elements of chromium ion deposition form black chromium carbide (CrC) and silicon (Si) and reacts with C SiC. The metal carbide ceramics and silicon carbide alternating deposition and occlusal film not only improves the

Hardness, but also to maintain the characteristics of silicon carbide surface friction coefficient is very low.

More recent evidence that chromium silicon target, Ti\/Cr\/TiAlC\/SiC structure film forming titanium silicon target reaction is DLC best transition link layer, can be in Ti\/Cr\/TiAlC\/SiC growth of DLC thick